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Influence of a constant magnetic field on the uniformity of plasma generated by planar ICP sourceInductively coupled plasma (ICP) sources are widely used in the technologies of plasma chemical

Диффузионно-легированные сплавы из металлических отходов производства с пониженной температурой плавления для формирования износостойких покрытий индукционной наплавкой токами высокой частоты for obtaining wear resistant coatings using induction hard-facing technologies

Geochemical and Lu-Hf (LA-ICP-MS) systematic of detrital zircons from lower neoproterozoic Lemeza Sandstones, Southern Uralsdetrital deposit

The first results of mass U-Pb isotope dating (LA-ICP-MS) for detrital zircons from the Asha Group, South Urals: Paleogeography and paleotectonicsdetrital deposit

Properties of Nitrogen/Silicon Doped Vertically Oriented Graphene Produced by ICP CVD Roll-to-Roll Technology them by using an inductively coupled plasma chemical vapor deposition (ICP CVD) is a technological

Simulation of high-power klystrons with heterogeneous focusing magnetic field becomes unacceptably large and it is technically difficult to obtain magnetic induction values of more

Noble metal speciations in hydrothermal sulphides-bearing deposits of the Urals, distribution and forms of NM were studied in base metal sulphides by laser ablation-inductively

New information about the mechanism of oil displacement from productive reservoirs using flow control technologies of methods application to increase oil recovery of deposits that are at the final stage of development

First results of the U-Pb isotopic (LA-ICP-MS) dating of detrital zircons from the lower paleozoic of spitsbergenInductively coupled plasma mass spectrometry

САМОФОРМИРОВАНИЕ НАНОСТРУКТУР НА ПОВЕРХНОСТИ КРЕМНИЯ В ПРОЦЕССАХ РАСПЫЛЕНИЯ И ПЕРЕОСАЖДЕНИЯ МЕТАЛЛЛОВ В ПЛАЗМЕ ВЧ ИНДУКЦИОННОГО РАЗРЯДА argon plasma of RF-inductive discharge are presented

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