Enhanced Ferroelectricity and Reliability in Sub-6 nm Ferroelectric Hf0.5Zr0.5O2/ZrO2/Hf0.5Zr0.5O2 Stack Film Compatible with BEOL Proces
Yinchi Liu,
Jining Yang,
Hao Zhang,
Golosov, D. A.,
Chenjie Gu,
Xiaohan Wu,
Hongliang Lu,
Lin Chen,
Shijin Ding,
Wenjun Liu
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