The effect of vacuum annealing on the structure and properties of the electrically conductive a-CN coating

Poplavsky, A.; Kudriavtsev, Yu.; Kolpakov, A.; Pilyuk, E.; Goncharov, I.

The effect of vacuum annealing on the structure and properties of the electrically conductive a-CN coating

Poplavsky, A., Kudriavtsev, Yu., Kolpakov, A., Pilyuk, E., Goncharov, I.

Дата публикации: 2021

Дата публикации в реестре: 2021-08-05T16:00:16Z

Аннотация:

Electrically conductive amorphous carbon nitride (a-CN) coatings were deposited onto various substrates by pulsed vacuum-arc sputtering of a graphite cathode with simultaneous irradiation of the substrate with nitrogen ions. Deposition temperature was less than 60 ◦C. We investigated the effect of vacuum annealing at a temperature of 600◦С on the elemental composition, structure, electrical and optical properties of the obtained films. It was found that the elemental composition of the coating practically does not change over the thickness of the coating after annealing, while the remaining characteristics change significantly

Ключевые слова:
physics, optics, nitrogenated amorphous carbon, pulsed vacuum arc deposition, electrical resistivity

Тип: Article