Fabrication of nanoporous silicon by ion implantation© Springer Science+Business Media Dordrecht 2015.
Ion implantation is an advanced new
Air ions and human environmentConformity to hygienic air
ion formula of working offices, classrooms and chemistry laboratory
Properties of plasma in an ECR minimum-B trap via numerical modeling period. The space geometry of the electron and
ion components as well as the
ion spectra both in the core
Synthesis of porous silicon with silver nanoparticles by low-energy ion implantation ion implantation into Si. In order to demonstrate this technique, the implantation at room temperature
The influence of low dose ion-irradiation on the mechanical properties of PMMA probed by nanoindentation of low dose B+-
ion-irradiation (6.25 ´ 1014
ion/cm2) on the mechanical properties (hardness and elastic