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Applications of UV-LIGA and grayscale lithography for display technologies-LIGA
and greyscale lithography based on SU-8 resist approaches were shown. Methods, technologies and structures
Texture feature extraction method based on grayscale recognitionTexture feature extraction method based on grayscale recognition
New technology from lab to fab: a case study on EUV lithographyNew technology from lab to fab: a case study on EUV lithography
Безмасковая литография – требование сегодняшнего дня fabrication. Mask fabrication process can only be eliminated by mask-free lithography.
Формирование субмикронного рельефа тонких пленок обратной литографией с использованием металлических и оксидных масок as masks for lift-off lithography to produce patterns of submicron dimensions
Developed RLE algorithm and bitplane slicing to compress grayscale imageNew suggested RLE compression algorithm to compress grayscale images with bitplane slicing
Investigating the Efficiency of Using U-Net, Erf-Net and DeepLabV3 Architectures in Inverse Lithography-based 90-nm Photomask GenerationThe paper deals with the inverse problem of computational lithography. We turn to deep neural
Annular surfaces in annular field systemsLithography
NbN superconducting nanonetwork fabricated using porous silicon templates and high-resolution electron beam lithography) with a top-down technique (high-resolution electron beam lithography). The method is easy to control
Fabrication of magnetic micro- and nanostructures by scanning probe lithography lithography. It has been shown that ferromagnetic nanoparticles with different domain structures can be formed
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