Applications of UV-LIGA and grayscale lithography for display technologiesTimoshkov, I. V.,
Khanko, V. T.,
Kurmashev, V. I.,
Grapov, D. V.,
Kostevich, A. A.,
Govor, G. A.,
Vetcher, A. K. substrate.
Metals like Fe, Ni, Co with additives like B, P were used to get the best soft
Metallization of Vias in Silicon Wafers to Produce Three-Dimensional Microstructures. Morpho-
logical studies of the
metal in the holes show that the structure of copper clusters is rather
AFM study of charging of the Au-n-GaAs contactEffect of charging of structural elements of a
metal–semiconductor Au–n-GaAs contact
Creation of lithographic masks using a scanning probe microscope)-based masks prepared by the SPL method are used to form
metal nanoparticles of the specified sizes and shape
Перспективы золь-гель технологии для нанофотоники и микроэлектроники of nanophotonics and
microelectronics
on the basis of results of PhD theses, defended within the projects
Method for stepped etching of optical glass fibers of optical glass fibers in the manufacture of
microelectronic devices has been demonstrated.