Spectral ellipsometry of cobalt-ions implanted silicon surface ions with energy of 40 keV at a fluence range from 6.6×1012 to 2.5×1017 Co+-
ion/cm2 were investigated
The Model of Ion Turbulent Heating in an ECRIS charge to mass in an electron cyclotron resonance
ion source (ECRIS). It was shown that the
ion heating
Sputtering of silicon surface by silver-ion implantation-energy high-dose implantation by Ag+
ions with energy E = 30 keV and current density J = 8 μA/cm2
Swelling and sputtering of porous germanium by silver ions of the radiation dose D = 6.2·1014–1.5·1017
ion/cm2 where observed. Using X-ray photoelectron spectroscopy
Metal ions as effectors of enzymesEffects of metal
ions as modulators of enzymes are considered. Data on inhibition and activation
Synthesis of porous silicon with silver nanoparticles by low-energy ion implantation ion implantation into Si. In order to demonstrate this technique, the implantation at room temperature