Study of silicon surface implanted by silver ions© 2018 Elsevier Ltd Ag+-
ion implantation of single-crystal c-Si at low-energy (E = 30 keV) high
Contribution of fungal biomass to persistent soil carbon across natural ecosystems between fungal biomass and
reactive mineral-associated carbon stocks in soils across six biomes supports
Passivation of GaAs by atomic hydrogen flow produced by the crossed beams method to avoid plasma
etching and heavy
ion bombardment that are so detrimental for many semiconductor devices
Effects of etching duration on silicon quantum dot size and photoluminescence quantum yieldYizhou He,
Qianxi Hao,
Chi Zhang,
Qi Wang,
Wenxin Zeng,
Jiamin Yu,
Xue Yang,
Xiaowei Guo,
Shaorong Li,
Lazarouk, S. K. to its cost-effectiveness. The
etching process in this method has the potential to
control the size of Si
COMPARATIVE ANALYSIS OF SMEAR LAYER REMOVAL TECHNIQUES IN THE TREATMENT OF DENTAL CARIES types of acids and to determine the most effective
etching technique to achieve maximum elimination
Extracellular redox cycling and hydroxyl radical production occurs widely in lichenized Ascomycetes Ascomycetes. Results show that given a quinone and chelated ferric
ions, many lichens can readily produce
Extracellular redox cycling and hydroxyl radical production occurs widely in lichenized Ascomycetes Ascomycetes. Results show that given a quinone and chelated ferric
ions, many lichens can readily produce