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Hydrogen-free reductive amination using iron pentacarbonyl as a reducing agent
Afanasyev O.I., Usanov D.L., Chusov D.
of substrates are suitable for the reaction, including those with low reactivity, e.g. benzophenone. Among
Nanostructured Coatings Based on Langmuir–Blodgett Films of Perfluorodecanoic Acid for Flexible Sensors for the Analysis of Lead Ions in Water
Melnikova, G. B., Sapsaliou, D. V., Tolstaya, T. N., Korolkov, I. V., Chizhik, S. A., Zhumanazar, N. N., Baranova, A. S., Zdorovets, M. V.
important task is to find methods to control their content in water. Track-etched membranes (TeMs) can
Environmental Impact of Cast Iron Production
Panov A.G., Shaekhova I.F., Ganiev M.M., Konogorskikh A.A., Shiapov T.I.
for obtaining etched micro sections for quantitative analysis of bainite. Due to the fact
Microscopic Examination of the Silicon Surface Subjected to High-Dose Silver Implantation
Vorob’ev V., Rogov A., Osin Y., Nuzhdin V., Valeev V., Eidel’man K., Tabachkova N., Ermakov M., Stepanov A.
© 2019, Pleiades Publishing, Ltd. Abstract: Low-energy (E = 30 keV) Ag + ions have been implanted
Purification and characterization of the proteinase ECP 32 from Escherichia coli A2 strain
Matveyev V., Usmanova A., Morozova A., Collins J., Khaitlina S.
-phenanthroline, EDTA, EGTA and zincone. The EDTA-inactivated enzyme can be reactivated by cobalt, nickel and zinc ions
Selective electrochemical deposition of indium in-between silicon nanowire arrays fabricated by metal-assisted chemical etching
Grevtsov, N., Chubenko, E., Petrovich, V., Bondarenko, V., Gavrilin, I., Dronov, A., Gavrilov, S.
etching of lightly-doped (100)-oriented silicon wafers is evaluated. It is concluded based on SEM and EDX
ИЗУЧЕНИЕ СВЯЗИ КОНЦЕНТРАЦИЙ НИКЕЛЯ, СЕРЕБРА, СТРОНЦИЯ, ЦИРКОНИЯ С ПОКАЗАТЕЛЯМИ С-РЕАКТИВНОГО БЕЛКА В СЫВОРОТКЕ КРОВИ
Юрасов В.В., Садыков А.Р., Морозова Г.Д., Намиот Е.Д., Лобанова Ю.Н., Рейнюк В.Л.
was to study the relationship of nickel, silver, strontium, zirconium with the C-reactive protein (as
Influence of the inert and active ion bombardment on structure of the transition metal thin films
Kamyshanchenko, N., Martynov, I., Neklyudov, I., Blazhevich, S. V.
The results of the experimental research of the inert (He, Ne, Ar, Kr, Xe) and active (O, N) ion
Effect of irradiation with continuous 28 MeV He2+ ion beam and short-pulsed 200 keV C+ ion beam on optical properties of multilayer Al-Si-N coatings
Konusov, Fedor V., Pavlov, S. K., Lauk, A. L., Sokhoreva, L. L., Gadirov, Ruslan M., Tarbokov, V., Remnev, Gennady E.
and monocrystalline silicon substrates by reactive magnetron sputtering. The samples were irradiated with helium ions
Формирование функциональных слоев нитрида кремния селективным плазмохимическим травлением
Емельянов, В. В.
Formation of Functional Silicon Nitride Layers by Selective Plasmochemical Etching

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