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Probability scheme of constructing the mathematical model of shadowed sputtering
Sevastianov L.A.
The probability scheme of examination of the shadowed vacuum sputtering process is suggested
Simulation of reactive magnetron sputtering system for deposition of thin films
Nguyen, V. T. A.
This paper simulates a magnetron sputtering system based on main design features to visualize
Analysis of problem in mathematical model for shadowed sputtering
Sevastianov L.A., Zhidkov E.P.
A mathematical model for shadowed sputtering is given. In frame of a given model there exist three
Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties
Luhin, V., Zarsky, I., Zhucowki, P.
by DC magnetron sputtering of indium with the subsequent thermal oxidation is developed. Structure
Balanced magnetic field in magnetron sputtering systems
Golosov, D. A., Голосов, Д. А.
Discharge characteristics of the planar axial magnetron sputtering systems (MSS) with different
Разрядные характеристики магнетронной распылительной системы при реактивном магнетронном распылении металлической ванадиевой мишени на постоянном и импульсном токе
Нестерчик, Р. И., Nestsiarchyk R. I.
-vacuum reactive magnetron sputtering. The presented dependences of the deposition rate of vanadium oxide films
Особенности нанесения тонких пленок сегнетоэлектриков при высокочастотном магнетроном распылении
Окоджи, Д. Э., Голосов, Д. А., Okojie, J. E., Golosov, D. A.
of the deposition rate for high-frequency (HF) magnetron sputtering of the ferroelectric targets of strontium
Advanced processes for low-temperature formation of functional metal oxide based thin films
Abduev A., Akhmedov A., Asvarov A., Kanevsky V., Muslimov A., Belyaev V., Generalov D., Nikolaeva D., Tirado J., Frah M.A.A.
The analysis the discharge processes in magnetron plasma, target sputtering processes, as well
Влияние временных характеристик импульсного питания на дугообразование и стабильность процесса при реактивном магнетронном распылении
Нестерчик, Р. И.
and process stability during reactive magnetron sputtering. The paper presents the experimentally obtained
The probability scheme of constructing the mathematical model of shadowed sputtering
Sevastianov L.A.
The probability scheme of constructing the mathematical model of shadowed sputtering

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