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Сегнетоэлектрические свойства пленок танталата стронция-висмута, нанесенных методом вч магнетроного распыления
Окоджи, Д.Э., Голосов, Д.А., Мельников, С.Н., Завадский, С.М., Колос, В.В., Поплевка, Е.А., Жукович, Ю.А., Okojie, J.E., Golosov, D.A., Melnikov, S.N., Zavadski, S.M., Kolos, V.V., Poplevka, E.A., Zhukovich, Yu.A.
deposited by means of HF magnetron sputtering on Pt/TiO2/SiO2/Si substrates, are investigated
Effect of preliminary vacuum plasma treatment on coating adhesion
Slabodchikov, Vladimir A., Borisov, Dmitry P., Kuznetsov, Vladimir M.
with subsequent magnetron sputtering. The substrate surface was pretreated with low-energy ion beams, high
Особенности реактивного магнетронного нанесения пленок оксида тантала при различных способах подачи газа в камеру
Доан, Х. Т., Голосов, Д. А., Бурдовицин, В. А., Завадский, С. М., Мельников, С. Н.
Peculiarity of reactive magnetron deposition of tantalum oxide films with different methods of gas
Properties of carbon coatings obtained by pulsed high power methods of vacuum-arc and magnetron sputtering
Poplavsky, A. I., Kolpakov, A. Ya., Galkina, M. E., Kovaleva, M. G., Mishunin, M. V.
of carbon coatings obtained by two different methods: high-power impulse magnetron sputtering and pulsed
Исследование процесса реактивного ионно-лучевого распыления арсенида галлия с использованием оптической эмиссионной спектроскопии
Телеш, Е. В., Telesh, E. V.
активных частиц кислорода.The aim of this work was to study the process of reactive ion-beam sputtering
КОАГУЛЯЦИЯ ПЫЛЕВЫХ ЧАСТИЦ В ПЛАЗМЕ МАГНЕТРОННОГО ВЧ РАЗРЯДА
Паль А. Ф., Рябинкин А. Н., Серов А. О., Филиппов А. В.
having mass above 10-10 g move along the ring-shaped sputtered trench and simultaneously oscillate
Long-lived photoinduced absorption in granular molybdenum disulfide thin films
Zinnatullin A., Vakhitov I., Rogov A., Yanilkin I., Nikitin S., Yusupov R.
were produced by means of a sulfurization of pre-deposited by magnetron sputtering thin molybdenum
Ion-plasma way of receiving strengthening heat reflecting anti-reflection coating
Galyautdinov R., Kashapov N.
for plastic screens of means of individual protection. The method of magnetron sputtering are received
Thin Film Microwave Absorber-Column-like Thermistor Couple Fabricated via Anodizing of Al/WTi for Rectangle Waveguide Calorimeter Sensor
Hoha, A., Turavets, U., Poznyak, A., Pligovka, A.
capacity of the calorimetric sensor. Thermistor was formed by anodizing of magnetron sputter-deposited Al
Quasi-one-dimensional Fulde-Ferrell-Larkin-Ovchinnikov-like state in Nb/Cu0.41Ni0.59 bilayers
Sidorenko A., Zdravkov V., Kehrle J., Morari R., Obermeier G., Gsell S., Schreck M., Müller C., Kupriyanov M., Ryazanov V., Horn S., Tagirov L., Tidecks R.
Nix bilayers (x = 0.59) of nanometer film thickness, prepared by magnetron sputtering (utilizing a moving

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