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Сильноточные источники ионов низких энергий для модификации поверхности и синтеза тонкопленочных структур is the development of high-current gas-discharge ion sources with a closed Hall current, research and perfecting
Измерение параметров пучков заряженных частиц в ионно-плазменных системах с использованием метода измерения тормозных характеристик and the results of measurement of the developed characteristics of the energy characteristics of the ion source
Model for ion-assisted film growthA new model of growing film densification is proposed. The film densiti as a function of ion energy
Irradiation effects in carbon fibers after N⁺ -ion irradiationSurface treatment of high modulus carbon fibers by pulsed N⁺-ion beams has been carried out
The effect of irradiation with nitrogen ions on the properties of pyrolytic graphiteThe effect of irradiation with nitrogen ions on the elemental composition, surface topography
Ионный источник на основе торцевого холловского ускорителя для предварительной “мягкой” очистки подложек characteristics of an ion source for "soft" ion cleaning are conducted. It is established that this source
An ECR source of multiply charged ions HELIOS-12AWe describe a Hot Electron Layer Ion Source (HELIOS) working in the 12 cm wavelength band
Properties of plasma in an ECR minimum-B trap via numerical modelingPlasma of a 14 GHz minimum-B source which is based on the electron cyclotron resonance phenomenon
Nucleophilic activity of peroxyhydrocarbonate and Peroxocarbonate ions relative to 4-nitrophenyl Diethyl phosphonateNucleophilic activity of peroxyhydrocarbonate and Peroxocarbonate ions relative to 4-nitrophenyl
Интегрированные ионно-плазменные процессы формирования тонкопленочных структур на рельефных поверхностях в условиях перераспыления.Object of investigation are development integrated ion plasma processes
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