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New way for synthesis of porous silicon using ion implantation
Stepanov A., Trifonov A., Osin Y., Valeev V., Nuzhdin V.
A novel idea to create a porous silicon layers by low-energy high-dose metal-ion implantation
Grain shape and size and structural and phase conditions modified by aluminum ion implantation in UFG titanium
Nikonenko, Alisa V., Nikonenko, Elena L., Kalashnikov, Mark P., Kurzina, Irina A., Popova, Natalja A.
. The ion implantation is carried out on Mevva-V.Ru ion source at ion-implantation dosages of 1·1017, 5
Ion-beam treatment of glass substrates for creation of biomatrices
Kashapov R., Khusaenova E., Faizrakhmanov I., Kashapov L.
with the Kaufman type ion source which produces beams of inert gases and nitrogen in diameter of 100 mm
EPR study of the CaF2 powder mechanochemical doping with rare-earth ions
Irisova I., Rodionov A., Tayurskii D., Yusupov R.
that in the process of the mechanochemical doping of the CaF2 fine particles with Er3+ and Yb3+ ions the cubic
Energy exchange between ions of Ce3+ and Tb3+ in crystals of fluoride
Scherbakov V., Andrianov S., Stolov A.
the variation of concentration of rare-earth ions. It leads to modification of energy transfer at various
Does Acute Pharmacological Test with Indomethacin Affect Nitrite Ion Blood Level?
Titarenko A., Valeeva I., Ziganshina L.
pharmacological test with indomethacin) reduced the blood serum nitrite ion level in patients who had been taking
PROTOTYPE OF HELIOS-12 SOURCE OF MULTIPLY CHARGED IONS
GOLOVANIVSKII K.S., DUGARZHABON V.D., REZNIKOV D.V., SAFONOV S.A.
PROTOTYPE OF HELIOS-12 SOURCE OF MULTIPLY CHARGED IONS
MAGNETIC-MIRROR TRAP WITH ELECTRON-CYCLOTRON PLASMA-HEATING AS A SOURCE OF MULTIPLY CHARGED IONS
GOLOVANIVSKII K.S.
MAGNETIC-MIRROR TRAP WITH ELECTRON-CYCLOTRON PLASMA-HEATING AS A SOURCE OF MULTIPLY CHARGED IONS
PRODUCTION OF BEAM OF NEGATIVE HYDROGEN AND DEUTERIUM IONS FROM SOURCE WITH ELECTRON-CYCLOTRON RESONANCE
GOLOVANIVSKII K.S., DZHAYAMANNA K., DUGARZHABON V.D.
PRODUCTION OF BEAM OF NEGATIVE HYDROGEN AND DEUTERIUM IONS FROM SOURCE WITH ELECTRON
Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source
Moreno J., Khodaee A., Okerstrom D., Bradley M.P., Couëdel L.
Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source

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