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Application of DC Magnetron Sputtering for Creation of Gas-Sensitive Indium Oxide Thin Films and Their Properties
Luhin, V., Zarsky, I., Zhucowki, P.
by DC magnetron sputtering of indium with the subsequent thermal oxidation is developed. Structure
Surface modification of tantalum pentoxide coatings deposited by magnetron sputtering and correlation with cell adhesion and proliferation in in vitro tests
Zykova, A., Safonov, V., Goltsev, A., Dubrava, T., Rossokha, I., Donkov, N., Yakovin, S., Kolesnikov, D., Goncharov, I., Georgieva, V.
pentoxide coatings deposited by reactive magnetron sputtering. The structural parameters of the as
Низкотемпературная плазма магнетронного разряда
Невлюдов, И. Ш., Гурин, Д. В., Гурин, В. Н., Хрусталев, К. Л., Nevliudov, I. Sh., Gurin, D. V., Gurin, V. N., Khrustalev, K. L.
of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode
Болометрические характеристики пленок оксида ванадия при легировании вольфрамом
То, К. Т.
films formed by reactive magnetron sputtering of a V-W mosaic target has been studied. The dependences
Формирование пленок оксида тантала на подложках диаметром 200 миллиметров
Вилья, Н., Голосов, Д. А., Мельников, С. Н., Нгуен, Т. Д., Голосов, А. Д., Villa, N., Golosov, D. A., Melnikov, S. N., Nguyen, T. D., Golosov, A. D., Litvin, E. E., Lam, N. N.
±18%. As a result of studies of the processes of reactive magnetron sputtering of a Ta target in an Ar
Исследование влияния отжига на механические и трибологические характеристики пленок нитрида титана-циркония
Лам, Н. Н., Lam, N. N.
deposited by pulsed reactive magnetron sputtering of a Ti-Zr mosaic target was studied. The dependences
Effect of short-pulsed ion irradiation on the optical and electrical properties of titanium nitride films deposited by reactive magnetron sputtering
Konusov, Fedor V., Pavlov, S. K., Lauk, A. L., Kabyshev, A. V., Novikov, V., Gadirov, Ruslan M., Tarbokov, V. A., Remnev, Gennady E.
by reactive magnetron sputtering on silicon and steel substrates has been studied. Relationships are obtained
Optical properties of aluminum- and silicon-nitride films and Al–Si–N nanocomposite coatings deposited by reactive magnetron sputtering
Konusov, Fedor V., Pavlov, S. K., Lauk, A. L., Kabyshev, A. V., Gadirov, Ruslan M.
and Al–Si–N coatings with variable atomic composition deposited by reactive magnetron sputtering on glass
Influence of film thickness on the dielectric characteristics of hafnium oxide layers
Golosov, D. A., Vilya, N., Zavadski, S. М., Melnikov, S. N., Avramchuck, A. V., Grekhov, М. М., Kargin, N. I., Komissarov, I. V., Голосов, Д. А., Завадский, С. М., Мельников, С. Н., Аврамчук, А. В., Комиссаров, И. В.
by reactive magnetron sputtering of the Hf target in Ar/O2 gas mixture. The X-ray diffraction analysis
Effect of the Degree of Aluminum Doping on the Mechanical and Tribological Characteristics of Titanium-Aluminum Nitride Films
Oks, E. M., Burdovitsin, V. A., Nguyen, T. D., Melnikov, S. N., Zavadski, S. M., Pobol, I. L., Kananovich, N. A., Tian, Xiubo, Lam, N. N., Голосов, Д. А., Нгуен, Т. Д., Мельников, С. Н., Завадский, С. М., Лам, Н. Н.
by the reactive magnetron sputtering of Ti–Al mosaic targets with different aluminum concentrations were studied

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