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Simulation of rarefied low pressure RF plasma flow around the sample
Zheltukhin V., Shemakhin A.
of the flow of radio frequency plasma at low pressure. The hybrid mathematical model includes the Boltzmann
A Microwave Discharge in High-Velocity Flows Initiated by a Half-Wave Antenna
Kornev K.N., Logunov A.A., Surkont O.S., Abushaev T.R., Volynets A.L., Dvinin S.A.
velocity and pressure. Electron concentration and temperature, along with characteristic gas temperature
Mathematical Simulation of a High-Frequency Low-Pressure Discharge with Gas Injection in Non-Local Approximation: Electro- and Plasmadynamics
Shemakhin A.Y., Zheltukhin V.S., Shemakhin E.Y.
The electro- and plasmadynamic parameters of a high-frequency discharge at a low pressure (13
Capacitive coupled RF discharge: Modelling at the local statement of the problem
Badriev I., Chebakova V., Zheltukhin V.
coupled RF discharge at atmospheric pressure is constructed, a method of numerical realization
Structure of carbon dendrites obtained in an atmospheric-pressure gas discharge
Danilaev M., Bogoslov E., Pol’skii Y., Nasybullin A., Pudovkin M., Khadiev A.
structure has been investigated. The threshold values of the ratio between electron temperature Te
Ubiquitous solar eruptions driven by magnetized vortex tubes
Kitiashvili I., Kosovichev A., Lele S., Mansour N., Wray A.
in their surroundings; the plasma density and temperature vary significantly across the eruptions. © 2013. The American
Changes in the electro-physical properties of MCT epitaxial films affected by a plasma volume discharge induced by an avalanche beam in atmospheric-pressure air
Grigoryev, Denis V., Lozovoy, Kirill A., Tarasenko, Viktor Fedotovich, Shulepov, Mikhail A., Voytsekhovskiy, Alexander V.
-uniform electric field at atmospheric pressure on samples of epitaxial films HgCdTe (MCT) films are discussed
Meteotsunami generation, propagation and amplification
Metin A.D., Pelinovsky E., Yalciner A.C., Zaytsev A., Tarakcioglu G.O., Yalciner B., Kurkin A.
is related to the spatial and temporal changes of atmospheric pressure. Because, low atmospheric pressure
Copper Oxide of Plasma-Chemical Synthesis for Doping Superconducting Materials
Ushakov, A. V., Karpov, I. V., Lepeshev, A. A., Fedorov, L. Y.
gas mixture of low pressure oxygen, were studied. It was shown that the particles possess nanometer
Managing the surface properties of materials of display technology by means of treatment in atmospheric discharge plasma
Zaporozhchenko, Y. V., Kotov, D. A., Aksiuchyts, A. V., Osipov, A. N., Paceev, S. V., Запорожченко, Ю. В., Котов, Д. А., Аксючиц, А. В., Осипов, А. Н., Пацеев, С. В.
processing in a plasma at atmospheric pressure are presented. It has been experimentally proved

Страница 8 из 4256

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