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Формирование функционального слоя интегральной микросхемы реактивно-ионным травлением process of selective reactive-ion etching of silicon nitride to polycrystalline silicon was obtained
Анализ технологии плазменной обработки полупроводниковых структур of dry etching, in particular, such a type of dry etching as ion-plasma processing, has been carried out
Формирование функциональных слоев нитрида кремния селективным плазмохимическим травлениемFormation of Functional Silicon Nitride Layers by Selective Plasmochemical Etching
Activity of Matrix Metalloproteinases (Mmps) Production by Dentine Matrix Depending on The Used Adhesive System: A Systematic Review.: which generation of adhesive systems has more effect on MMPs? How does it affect them? Etch-and rinse
Early Bone Response to Dual Acid-Etched and Machined Dental Implants Placed in the Posterior Maxilla in Yemen: a Histomorphometry Human StudyThis study investigates the early peri-implant bone healing of dual acid-etched (DAE) versus
Comparative evaluation of the shear strength of orthodontic adhesives for fixation of brackets the shear bond strength of a 5th generation adhesive system and a universal adhesive system in two etching
Ion etching of HgCdTe: Properties, patterns and use as a method for defect studiesAnalysis is performed of the contemporary views on the effect of ion etching (ion-beam milling
Near-field optical taper antennas fabricated with a highly replicable ac electrochemical etching methodThis paper describes a novel chemical etching method to fabricate high quality near-field optical
Features of nanotemplates manufacturing on the II-VI compound substratesCdS and ZnO single crystal substrates for the preparation of nanoporous matrices by electrochemical etching
Nanoporous Al2O3 Assisted Anodizing of WTi Alloy galvanostatically reanodized. Time-current and time-voltage, morphology and composition, chemical etching
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