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Application of Thin Piezoelectric Films in DiamondBased Acoustoelectronic Devices

Boris P. Sorokin, Gennady M. Kvashnin, Andrey S. Novoselov, Sergey I. Burkov, Anton B. Shipilov, Nikolay V. Luparev, Victor V. Aksenenkov, Vladimir D. Blank

The theory of external loading influence on acoustic parameters of piezoelectric fivelayered

Optimisation of spontaneous four-wave mixing in a ring microcavity

Chuprina I., An P., Zubkova E., Kovalyuk V., Kalachev A., Gol'tsman G.

of the waveguide is studied for a specific case of a ring microcavity made of silicon nitride. The results

Temperature dependence of the thermal conductivity of wurtzite aluminum nitride, gallium nitride and aluminum-gallium nitride

Volcheck, V. S., Hvazdouski, D. C., Baranava, M. S., Stempitsky, V. R.

Temperature dependence of the thermal conductivity of wurtzite aluminum nitride, gallium nitride

Технология селективного реактивно-ионного травления нитрида кремния к поликристаллическому кремнию

Емельянов, В. В., Emelyanov, V. V.

of external discharge characteristics on the quality parameters of reactiveion etching of a layer of silicon

Synthesis and characterization of titanium nitride thin films for enhancement and localization of optical fields

metal nitrides, being refractory metals with tunable optical properties, are prominent representatives

Mechanical and elastic properties of new silicon nitride ceramics produced by cold isostatic pressing and free sintering

The mechanical and elastic properties of new silicon nitride fabricated by cold isostatic pressing

Generation of low-temperature plasma by low-pressure arcs for synthesis of nitride coatings

Krysina, Olga V., Lopatin, I. V., Kovalsky, Sergey S., Koval, Nikolay N.

-plasma source affects the parameters of the metal-gas plasma and the element concentrations in the coatings

Continuous flow synthesis of high valuable N-heterocycles via catalytic conversion of levulinic acid

Rodríguez-Padrón D., Puente-Santiago A.R., Balu A.M., Muñoz-Batista M.J., Luque R.

Graphitic carbon nitride (g-C3N4) was successfully functionalized with a low platinum loading

Microstructure of spark plasma-sintered silicon nitride ceramics

Lukianova, O. A., Novikov, V. Yu., Parkhomenko, A. A., Sirota, V. V., Krasilnikov, V. V.

-sintered silicon nitride were investigated. Fully dense silicon nitride ceramics with a typical α-Si₃N₄ equiaxed

RF-Magnetron sputtering of silicon carbide and silicon nitride films for solar cells

Zakhvalinskii, V. S., Piljuk, E. A., Goncharov, I. Yu., Rodriges, V. G., Taran, S. V.

for obtaining thin silicon carbide and silicon nitride films, that are used for constructing solar cells based

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